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A novel magnetic assistant polishing technology

机译:新型磁助抛光技术

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The fabrication of the aspheric optics is quite important in optical engineering. In this paper, a novel magnetic assistant polishing technology and device is researched to complete the finish step of the optics. As the device working, the magnetic powder arranged with the magnetic field distribution. The magnetic powder became a brush. The magnet wheel working with a high rolling velocity and the polishing liquid with abrasive is injected to contact region. The magnetic powder brush is reforming with the magnetic field all the time, so the removal tool of the fabrication is invariable. The device, as shown in Fig. 1, is connected to the CNC machine and experiment is completed to get the removal function. As shown in Fig. 2, the shape of the removal function is like a raindrop and asymmetry in one orientation. The shape is different with tradition CCOS removal function, which is circular symmetry. The removal stability of the device is also researched. The experiment work-piece is K9 glass plane, and the effectual abrasive is CeO2. the total fabrication time is about one hour. This four spot is fabricated in sequence, the interval time is 15 minutes. The surface error is measure by Zygo interferometer, and the data is deal with MetroPro software. The peak value of the removal function is 0. 526X,0. 528X,0. 552X.O. 549X. The maximal removal difference is 2. 5%. Therefore, as shown in Fig. 3, the removal stability of magnetic assistant polishing device is 97. 5 % in one hour. The roughness of the final surface achieved Ra 1. 4 nm. The research make quite good precondition to fabricate high precision aspheric optics.
机译:非球面光学器件的制造在光学工程中非常重要。本文研究了一种新颖的磁性辅助抛光技术和装置,以完成光学器件的精加工步骤。随着装置的工作,磁性粉末随磁场分布而排列。磁性粉末变成了刷子。以高滚动速度工作的磁轮和带有研磨剂的抛光液被注入到接触区域。磁粉刷一直在通过磁场进行整形,因此制造的拆卸工具是不变的。如图1所示,该设备已连接到CNC机床,并完成了实验以获得移除功能。如图2所示,去除函数的形状像雨滴和一个方向上的不对称。形状与传统的CCOS去除功能不同,它是圆形对称的。还研究了装置的去除稳定性。实验工件为K9玻璃平面,有效磨料为CeO2。总制造时间约为一小时。这四个点是按顺序制作的,间隔时间为15分钟。用Zygo干涉仪测量表面误差,并用MetroPro软件处理数据。去除功能的峰值为0。526X,0。 528X,0。 552X.O. 549X。最大去除差异为2. 5%。因此,如图3所示,磁性辅助抛光装置的去除稳定性在一小时内为97.5%。最终表面的粗糙度达到Ra 1. 4 nm。该研究为制造高精度非球面光学器件提供了很好的前提。

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