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REMOVAL OF BORON FROM METALLURGICAL-GRADE SILICON BY APPLYING CaO-BASED FLUX TREATMENT

机译:钙基助熔剂处理从冶金级硅中去除硼

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摘要

In order to develop an effective process for the production of a solar-grade silicon (SOG-Si) from metallurgical-grade one (MG-Si), the oxidation removal of boron from molten MG-Si was investigated at 1773 K by the following two CaO-saturated CaO-CaF_2 flux treatment processes. Ⅰ) Boron removal by flux addition onto the molten MG-Si followed by oxygen gas injection into the melt (Two-stage connecting process). Ⅱ) Boron removal by simultaneous injection of flux powders and oxygen gas into the molten MG-Si (Simultaneous injection process). These processes can establish the special condition of both high basicity of the flux and the high oxygen partial pressure at the boron removal reaction sites.Through these processes, especially by the simultaneous injection process using a flux powder injection equipment, the boron content in MG-Si can be efficiently reduced. The obtained results clarified that both processes should be conducted for a time period as short as possible by using as much flux as possible. By repeating the simultaneous injection process for 60 s three times under the optimum operating conditions determined in the present study, the boron content in MG-Si can be reduced from 14 to 4.7 mass ppm.
机译:为了开发一种有效的从冶金级硅(MG-Si)生产太阳能级硅(SOG-Si)的方法,通过以下方法研究了在1773 K下从熔融MG-Si中氧化去除硼的方法:两个CaO饱和的CaO-CaF_2助熔剂处理工艺。 Ⅰ)通过在熔融的MG-Si上添加助熔剂来去除硼,然后将氧气注入熔体中(两步连接过程)。 Ⅱ)通过同时向熔融的MG-Si中注入助熔剂粉末和氧气来去除硼(同时注入过程)。这些工艺可以建立特殊的条件,使熔剂具有较高的碱度,并且在除硼反应位点具有较高的氧分压。通过这些工艺,特别是通过使用熔剂粉末注射设备的同时注射工艺,MG-可以有效地减少Si。获得的结果表明,通过使用尽可能多的助熔剂,两个过程都应在尽可能短的时间内进行。通过在本研究确定的最佳操作条件下,将同时注入过程重复60 s 3次,可以将MG-Si中的硼含量从14质量ppm降低至4.7质量ppm。

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