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首页> 外文期刊>Acta Materialia >CRYSTALLOGRAPHIC ASPECTS OF GEOMETRICALLY- NECESSARY AND STATISTICALLY-STORED DISLOCATION DENSITY
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CRYSTALLOGRAPHIC ASPECTS OF GEOMETRICALLY- NECESSARY AND STATISTICALLY-STORED DISLOCATION DENSITY

机译:几何上必要和统计存储的位移密度的晶体学方面

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摘要

Classical plasticity has reached its limit in describing crystalline material behavior at the micron level and below. Its inability to predict size-dependent effects at this length scale has motivated the use of higher-order gradients to model material behavior at the micron level. The physical motivation behind the use of strain gradients has been based on the framework of geometrically-necessary dislocations (GNDs). A new but equivalent definition for Nye's dislocation tensor, a measure of GND density, is proposed, based on the integrated properties of dislocation lines within a volume. A discrete form of the definition is applied to redundant crystal systems, and methods for characterizing the dislocation tensor with realizable crystallographic dislocations are presented. From these methods and the new definition of the dislocation tensor, two types of three-dimensional dislocation structures are foundf open periodic networks which have long-range geometric consequences, and closed three-dimensional dislocation structures which self-termi- nate, having no geometric consequence. The implications of these structures on the presence of GNDs in polycrystalline materials lead to the introduction of a Nye factor relating geometrically-necessary dislo- cation density to plastic strain gradients.
机译:在描述微米级及以下的晶体材料行为时,经典可塑性已达到其极限。由于无法预测在此长度范围内尺寸相关的效应,因此促使人们使用更高阶的梯度来模拟微米级的材料行为。使用应变梯度背后的物理动机是基于几何上必需的位错(GND)的框架。基于体中位错线的综合性质,提出了一种新的但等效的Nye位错张量定义,即GND密度的度量。该定义的离散形式被应用于冗余晶体系统,并提出了利用可实现的晶体学位错表征位错张量的方法。从这些方法和位错张量的新定义中,发现了两种类型的三维位错结构:具有周期性几何影响的开放式周期性网络;以及自定的,没有几何位错的封闭三维位错结构。后果。这些结构对多晶材料中GND的存在的影响导致引入了Nye因子,该因子将几何上必要的位移密度与塑性应变梯度相关联。

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