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首页> 外文期刊>Acta Materialia >KINETIC PHASE FIELD PARAMETERS FOR THE Cu-Ni SYSTEM DERIVED FROM ATOMISTIC COMPUTATIONS
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KINETIC PHASE FIELD PARAMETERS FOR THE Cu-Ni SYSTEM DERIVED FROM ATOMISTIC COMPUTATIONS

机译:原子计算得出的Cu-Ni体系的动力学相场参数

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In the phase field model of binary solidification the mobility terms which appear in the govern- ing rate equations can be estimated from the liquid diffusion coefficients of the pure elements and the vel- ocity of the solid-liquid interface as a function of undercooling. Molecular dynamics simulations utilizing embedded atom potentials have been employed to compute the liquid diffusivities for pure Cu and Ni in the vicinity of their melting points. In both cases the diffusion coefficient is found to vary linearly with tem- perature and the results are in good agreement with experimental values which are available for Cu. The simulations were also employed to obtain the boundary velocities in three different low index growth direc- tions. The results for Cu and Ni were found to be very similar, with the slope of the velocity-undercooling curve at small undercoolings varying in the range 45-18 cm/s/K. Anisotropy in the growth behavior was observed with V_1oo > V_110 > V_111. The solid-liquid interface velocities were found to be a factor of 4-5 less than the theoretical upper limit derived previously.
机译:在二元凝固的相场模型中,可以根据纯元素的液体扩散系数和固-液界面的速度作为过冷的函数来估算在控制速率方程中出现的迁移率项。利用嵌入的原子势的分子动力学模拟已被用来计算纯铜和镍在其熔点附近的液体扩散率。在这两种情况下,均发现扩散系数随温度线性变化,其结果与可用于铜的实验值高度吻合。该模拟还被用于获得三种不同的低指数增长方向上的边界速度。发现铜和镍的结果非常相似,在较小的过冷度下,速度-过冷曲线的斜率在45-18 cm / s / K范围内变化。 V_1oo> V_110> V_111观察到生长行为的各向异性。发现固液界面速度比先前推导的理论上限小4-5倍。

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