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首页> 外文期刊>Journal of Applied Physics >Electrical current leakage and open-core threading dislocations in AlGaN-based deep ultraviolet light-emitting diodes
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Electrical current leakage and open-core threading dislocations in AlGaN-based deep ultraviolet light-emitting diodes

机译:AlGaN基深紫外发光二极管中的漏电流和开芯线错位

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摘要

Electrical current transport through leakage paths in AlGaN-based deep ultraviolet (DUV) light-emitting diodes (LEDs) and their effect on LED performance are investigated. Open-core threading dislocations, or nanopipes, are found to conduct current through nominally insulating Al0.7Ga0.3N layers and limit the performance of DUV-LEDs. A defect-sensitive phosphoric acid etch reveals these open-core threading dislocations in the form of large, micron-scale hexagonal etch pits visible with optical microscopy, while closed-core screw-, edge-, and mixed-type threading dislocations are represented by smaller and more numerous nanometer-scale pits visible by atomic-force microscopy. The electrical and optical performances of DUV-LEDs fabricated on similar Si-doped Al0.7Ga0.3N templates are found to have a strong correlation to the density of these nanopipes, despite their small fraction (<0.1% in this study) of the total density of threading dislocations.
机译:研究了基于AlGaN的深紫外(DUV)发光二极管(LED)中泄漏路径的电流传输及其对LED性能的影响。发现开芯螺纹位错或纳米管通过标称绝缘的Al 0.7 Ga 0.3 N层传导电流,并限制了DUV-LED的性能。缺陷敏感的磷酸蚀刻以光学显微镜可见的微米级六边形大蚀刻凹坑形式揭示了这些开芯螺纹位错,而闭芯螺纹,边缘和混合型螺纹位错则表示为原子力显微镜可以看到更小的,更多的纳米级凹坑。尽管在类似的硅掺杂的Al 0.7 Ga 0.3 N模板上制造的DUV-LED的电学和光学性能与这些纳米管的密度有很强的相关性,尽管占线错位总密度的很小一部分(本研究中为<0.1%)。

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