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首页> 外文期刊>Journal of Applied Physics >Stress stabilization of a new ferroelectric phase incorporated into SrTaO2N thin films
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Stress stabilization of a new ferroelectric phase incorporated into SrTaO2N thin films

机译:掺入SrTaO 2 N薄膜中的新铁电相的应力稳定

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摘要

Microstructural analyses of highly stressed SrTaO2N thin films deposited on SrTiO3 substrates by cathodoluminescence spectroscopy revealed coexistence of ferroelectric and relaxor-ferroelectric-like phases in the films. These two phases are, respectively, associated with “trans-type” and “cis-type” anion orders, as supported by the relative difference of the band gap energies calculated by first principles calculations based on the density functional theory. The formation of the new ferroelectric phase is considered to occur upon stabilization by the high compressive residual stress stored into the film structure, with the length/size of the “trans-type” region strongly depending upon the local stress state in the film.
机译:通过阴极荧光光谱对沉积在SrTiO 3 衬底上的高应力SrTaO 2 N薄膜的显微结构分析表明,薄膜中铁电相和弛豫铁电相共存。这两个相分别与“反式”和“顺式”阴离子级关联,这由基于密度泛函理论的第一原理计算所计算出的带隙能量的相对差所支持。新的铁电相的形成被认为是由于存储在薄膜结构中的高压缩残余应力而稳定后发生的,“反型”区域的长度/大小强烈取决于薄膜中的局部应力状态。 / p>

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