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首页> 外文期刊>Nuclear Instruments & Methods in Physics Research >Effect of surface roughness on the measurement of electron impact inner-shell ionization cross sections using thick-target method
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Effect of surface roughness on the measurement of electron impact inner-shell ionization cross sections using thick-target method

机译:表面粗糙度对厚靶法测量电子轰击内壳电离截面的影响

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摘要

The effect of surface roughness on the measurement of electron impact inner-shell ionization cross sections in the thick-target method has been studied by using Monte Carlo simulations. The surface roughness structures were described by a series of hemispheres, which were produced randomly on the smooth surface of a thick Ni target. The characteristic X-ray yields of K-shell ionization for Ni element by electron impact near threshold energy were obtained by Monte Carlo simulations for the target with smooth surface and the targets with various surface roughnesses. The Tikhonov regularization method was applied to treat the inverse problem involved and obtain the K-shell ionization cross sections for Ni element. The comparisons between K-shell ionization cross sections of Ni element obtained for the target with smooth surface and the targets with various surface roughnesses were made. The results show that the effect of surface roughness increases as the roughness increases and the surface roughness of the target should be limited to less than 100 nm if the experimental error originated from the surface roughness would be kept less than 2%.
机译:通过使用蒙特卡洛模拟研究了厚靶法中表面粗糙度对电子轰击内壳电离截面测量的影响。表面粗糙度结构由一系列半球描述,这些半球在厚厚的镍靶材的光滑表面上随机产生。通过蒙特卡罗模拟,对具有光滑表面的靶材和具有各种表面粗糙度的靶材,通过阈值能量附近的电子撞击获得了镍元素的K壳电离的特征X射线产率。应用Tikhonov正则化方法处理所涉及的反问题,并获得Ni元素的K壳电离截面。比较了具有光滑表面的靶材和具有各种表面粗糙度的靶材所获得的Ni元素的K壳电离截面。结果表明,如果将由表面粗糙度引起的实验误差保持在2%以下,则表面粗糙度的影响会随着粗糙度的增加而增加,并且靶的表面粗糙度应限制在100 nm以下。

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