...
机译:低能量重离子TOF-ERDA装置,用于定量测量薄膜S的深度轮廓。
IMEC, Kapeldreef75, B-3001 Leuven, Belgium,KU. Leuven, INSYS, Kasteelpark Arenberg 10, B-3001 Leuven, Belgium;
Department of Physics, P.O. Box 35, FIN-40014, University of jyvaeskyiae, Finland;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium,Jnstiruut voor Kern-en Stralingsfysica and INPAC, K.U. Leuven, Celestijnenlaan 200D, B-3001 Leuven, Belgium;
Jnstiruut voor Kern-en Stralingsfysica and INPAC, K.U. Leuven, Celestijnenlaan 200D, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium,Jnstiruut voor Kern-en Stralingsfysica and INPAC, K.U. Leuven, Celestijnenlaan 200D, B-3001 Leuven, Belgium;
elastic recoil detection; time-of-flight; thin film analysis; depth profiling;
机译:溅射引起的表面粗糙度的定量评估及其对多晶Ni / Cu多层薄膜的AES深度分布的影响
机译:多元素薄膜定量溅射深度剖析的优先溅射
机译:辉光放电光发射光谱法用于CIGS薄膜的定量深度分析
机译:使用等离子体轮廓飞行时间质谱快速,半定量深度轮廓分析超薄膜:AM:高级计量
机译:使用X射线衍射分析钨薄膜中的深度轮廓残余应力。
机译:使用冠烯离子溅射源的可待用油负载聚(L-乳酸)膜的定量XPS深度分析
机译:Gamnas / Gaas(001)薄膜生长的异常mn深度剖面 分子束外延