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机译:
College of Physics and Electronic Information, Inner Mongolia Normal University, Huhhot 010022, China;
Institute of Physics Science, Graduate University of Chinese Academy of Sciences, Beijing 100049, China;
radio-frequency plasma enhanced chemical vapor deposition (rf-PECVD); microcrystalline silicon film; high rate deposition;
机译:Optical, structural and composition properties of silicon nitride films deposited by reactive radio-frequency sputtering, low pressure and plasma-enhanced chemical vapor deposition
机译:High rate deposition of diamond like carbon films by very high frequency plasma enhanced chemical vapor deposition at 100 MHz
机译:Characterization of microcrystalline silicon thin film solar cells prepared by high working pressure plasma-enhanced chemical vapor deposition
机译:a novel approach to Co/CNTs catalyst via chemical vapor deposition of organometallic compounds