首页> 外国专利> Removing hydrogen sulfide from gas washing solution, in which both hydrogen sulfide and sulfur are soluble, comprises e.g. releasing hydrogen sulfide in gas washing solution, oxidizing hydrogen sulfide, and precipitating elemental sulfur

Removing hydrogen sulfide from gas washing solution, in which both hydrogen sulfide and sulfur are soluble, comprises e.g. releasing hydrogen sulfide in gas washing solution, oxidizing hydrogen sulfide, and precipitating elemental sulfur

机译:从气体洗涤溶液中除去硫化氢,其中硫化氢和硫都可溶于其中,例如包括。在气体洗涤液中释放硫化氢,氧化硫化氢并沉淀出元素硫

摘要

Removing hydrogen sulfide from a gas washing solution, in which both hydrogen sulfide and sulfur are soluble, comprises: (a) releasing the hydrogen sulfide in the gas washing solution, (b) oxidizing the hydrogen sulfide to elemental sulfur, and (c) precipitating elemental sulfur, where the step (c) further comprises (d) precipitating crystalline sulfur by mixing at least a portion of gas washing solution with crystallization fluid, (e) separating sulfur from fluid mixture of gas washing solution and crystallization fluid, and (f) separating the crystallization fluid from gas washing solution. Removing hydrogen sulfide from a gas washing solution, in which both hydrogen sulfide and sulfur are soluble, comprises: (a) releasing the hydrogen sulfide in the gas washing solution, (b) oxidizing the hydrogen sulfide to elemental sulfur, and (c) precipitating the elemental sulfur, where the step (c) further comprises (d) precipitating crystalline sulfur by mixing at least a portion of the gas washing solution with a crystallization fluid, where the elemental sulfur is insoluble in the crystallization fluid or has a solubility, which is at least smaller by a factor of 10 than the solubility of the sulfur in the gas washing solution, (e) separating the sulfur from the fluid mixture of gas washing solution and crystallization fluid, and (f) separating the crystallization fluid from the gas washing solution. An independent claim is also included for a device for removing hydrogen sulfide from the gas washing solution in a gas washing circuit, comprising (i) an absorption column (1), a heat exchanger (5) and a desorption column (3), where the desorption column, in which the hydrogen sulfide is oxidized to elemental sulfur exhibits a feed (31) for a gaseous stripping medium and a gas washing solution inlet, where the feed for a gaseous stripping medium is connected with a gas washing solution outlet of the gas washing device, and a gas washing solution flow and an exhaust pipe, (ii) a crystallizer (4) comprising a gas washing solution inlet for receiving at least part of the scrubber solution from scrubber solution flow, a crystallization fluid supply line for supplying a crystallization fluid, a sedimentation section for settling the crystallized sulfur, an outlet for removing the crystallized sulfur and a gas washing solution flow for removing the sulfur gas washing solution from the crystallizer, (iii) a rear guide, which is connected to the gas washing solution flow and the gas scrubbing circuit, and (iv) a fluid separating device for separating the crystallization fluid from the gas washing solution.
机译:从其中溶解有硫化氢和硫的气体洗涤溶液中除去硫化氢包括:(a)在气体洗涤溶液中释放硫化氢,(b)将硫化氢氧化成元素硫,以及(c)沉淀元素硫,其中步骤(c)进一步包括(d)通过将至少一部分气体洗涤溶液与结晶流体混合沉淀出结晶硫,(e)从气体洗涤溶液和结晶流体的流体混合物中分离硫,以及(f )从气体洗涤溶液中分离出结晶液。从其中溶解有硫化氢和硫的气体洗涤溶液中除去硫化氢包括:(a)在气体洗涤溶液中释放硫化氢,(b)将硫化氢氧化成元素硫,以及(c)沉淀元素硫,其中步骤(c)进一步包括(d)通过将至少一部分气体洗涤溶液与结晶流体混合来沉淀结晶硫,其中元素硫不溶于结晶流体或具有溶解性,至少比硫在气体洗涤溶液中的溶解度小10倍,(e)从气体洗涤溶液和结晶流体的流体混合物中分离硫,以及(f)从气体中分离结晶流体洗涤液。还包括用于从气体洗涤回路中的气体洗涤溶液中除去硫化氢的装置的独立权利要求,其包括(i)吸收塔(1),热交换器(5)和解吸塔(3),其中在其中将硫化氢氧化成元素硫的解吸塔具有用于气态汽提介质的进料(31)和气体洗涤溶液入口,其中用于气态汽提介质的进料与反应塔的气洗溶液出口相连气体洗涤装置,气体洗涤液流和排气管,(ii)结晶器(4),其包括用于从洗涤液流接收至少一部分洗涤液的气体洗涤液入口,用于供应的结晶液供应管线结晶液,用于沉淀结晶硫的沉淀部分,用于去除结晶硫的出口以及用于从结晶器中去除硫洗涤液的气体洗涤液流变流器,(iii)后导板,其连接至气体洗涤液流和气体洗涤回路,以及(iv)流体分离装置,用于将结晶流体与气体洗涤液分离。

著录项

  • 公开/公告号DE102010049451A1

    专利类型

  • 公开/公告日2012-04-26

    原文格式PDF

  • 申请/专利权人 HAASE ENERGIETECHNIK AG & CO. KG;

    申请/专利号DE20101049451

  • 发明设计人 REHER SVEN;AURICHT SOEREN;

    申请日2010-10-23

  • 分类号C02F9/04;C02F1/52;C02F1/72;C02F1/74;

  • 国家 DE

  • 入库时间 2022-08-21 17:05:17

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