DEVICE FOR CARRYING SUBSTRATE, DEVICE FOR CLEANING SUBSTRATE USING THE SAME, AND METHOD FOR CARRYING SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To advance/retreat a plurality of wafer-holding hands with a simplified or compact constitution. ;SOLUTION: Wafer-holding hands H1, H2 are commonly fixed to a bracket B1 and wafer-holding hands H3, H4 are commonly fixed to a bracket B2. The brackets B1, B2 are independently advanced/retreat along X direction by a pair of advance/retreat mechanisms received in a moving-up-and-down rotary base 23. By advance/retreat of the bracket B1, the wafer-holding hands H1, H2 are integrally advanced/retreat and the wafer-holding hands H3, H4 are integrally advanced/retreat by the advance/retreat of the bracket B2.;COPYRIGHT: (C)1999,JPO