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首页> 外文期刊>Radiochimica Acta: International Journal for Chemical Aspects of Nuclear Science and Technology >On the study of Th(IV)-humic acid interactions by competition sorption studies with silica and determination of global interaction constants [Review]
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On the study of Th(IV)-humic acid interactions by competition sorption studies with silica and determination of global interaction constants [Review]

机译:硅胶竞争吸附研究Th(IV)-腐植酸相互作用的研究及整体相互作用常数的确定[综述]

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摘要

The influence of humic acids (HA) on the retention of thorium (IV) onto the surface of silica colloids is investigated. Thorium is considered as an analogue of tetravalent actinides (U. Np, Pu), except for the fact that it has no f electrons. Silica (SiO2) is chosen as a model surface because it is a component of many minerals and because of its weak HA sorption properties. Retention experiments are performed by batch procedure at constant ionic strength (I = 0.1 M NaClO4), at various pH (2 to 9) and HA concentrations (I - 100 mg/L). The sorption of Th(IV) onto colloidal amorphous silica is characterised using a surface complexation model. The ternary system (i.e. HA-Th-Silica) clearly shows the influence of HA on Th(IV) retention. This can lead to a strong reduction of the amount of Th(IV) sorbed onto silica in the presence of HA compared to silica colloids without HA, due to a predominant part of thorium present in solution as humic complexes. In a pH range where no organic coating onto silica occurs. there is a competitive reaction between Th(IV) sorption onto the silica surface and onto HA reactive functional groups. In this case, Schubert's method is applied to obtain a global interaction constant for the Th(IV)-HA system. The large interaction constant values indicate a strong affinity of HA for Th(IV). [References: 103]
机译:研究了腐殖酸(HA)对th(IV)在二氧化硅胶体表面上的保留率的影响。 ium被认为是四价act系元素的类似物(U. Np,Pu),但它没有f电子。选择二氧化硅(SiO2)作为模型表面是因为它是许多矿物的组成部分,并且具有弱的HA吸附性能。保留实验是通过在恒定的离子强度(I = 0.1 M NaClO4),各种pH(2至9)和HA浓度(I-100 mg / L)下分批进行的。使用表面络合模型表征了Th(IV)在胶态无定形二氧化硅上的吸附。三元系统(即HA-Th-二氧化硅)清楚地显示了HA对Th(IV)保留的影响。与不含HA的二氧化硅胶体相比,在HA存在下,吸附在二氧化硅上的Th(IV)量会大大减少,这是因为溶液中的以腐殖配合物的形式存在。在没有有机涂层在二氧化硅上的pH范围内。 Th(IV)吸附在二氧化硅表面和HA反应性官能团之间存在竞争性反应。在这种情况下,应用舒伯特方法获得Th(IV)-HA系统的全局相互作用常数。大的相互作用常数值表明HA对Th(IV)有很强的亲和力。 [参考:103]

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