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Band gap, electronic structure, and surface electron accumulation of cubic and rhombohedral In_2O_3

机译:立方和菱面In_2O_3的带隙,电子结构和表面电子积累

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摘要

The bulk and surface electronic structure of In_2O_3 has proved controversial, prompting the current combined experimental and theoretical investigation. The band gap of single-crystalline In_2O_3 is determined as 2.93 ±0.15 and 3.02 ±0.15 eV for the cubic bixbyite and rhombohedral polymorphs, respectively. The valence-band density of states is investigated from x-ray photoemission spectroscopy measurements and density-functional theory calculations. These show excellent agreement, supporting the absence of any significant indirect nature of the In_2O_3 band gap. Clear experimental evidence for an s-d coupling between In 4d and O 2s derived states is also observed. Electron accumulation, recently reported at the (001) surface of bixbyite material, is also shown to be present at the bixbyite (111) surface and the (0001) surface of rhombohedral In_2O_3.
机译:In_2O_3的体电子结构和表面电子结构已被证明是有争议的,这促使当前的实验和理论研究相结合。对于立方方铁锰矿和菱面体多晶型物,单晶In_2O_3的带隙分别确定为2.93±0.15和3.02±0.15 eV。从X射线光电子能谱测量和密度泛函理论计算研究了价带态的密度。这些显示出极好的一致性,支持了In_2O_3带隙没有任何显着的间接性质。还观察到In 4d和O 2s衍生态之间s-d偶联的明确实验证据。最近还报道了在方铁矿材料的(001)表面的电子积累,也存在于菱形In_2O_3的方铁矿(111)表面和(0001)表面。

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  • 来源
    《Physical review》 |2009年第20期|205211.1-205211.10|共10页
  • 作者单位

    Department of Physics, University of Warwick, Coventry CV4 7AL, United Kingdom;

    Department of Physics, University of Warwick, Coventry CV4 7AL, United Kingdom;

    Institut fuer Festkoerpertheorie und-Optik, Friedrich-Schiller-Universitaet, Max-Wien-Platz I, D-07743 Jena, Germany;

    Fraunhofer-lnstitut fuer Angewandte Festkoerperphysik, Tullastrasse 72, 79108 Freiburg, Germany;

    Department of Chemistry, Chemistry Research Laboratory, University of Oxford, Mansfield Road, Oxford OX1 3TA, United Kingdom;

    Department of Chemistry, Chemistry Research Laboratory, University of Oxford, Mansfield Road, Oxford OX1 3TA, United Kingdom;

    Department of Chemistry, Chemistry Research Laboratory, University of Oxford, Mansfield Road, Oxford OX1 3TA, United Kingdom;

    Department of Physics, University of Warwick, Coventry CV4 7AL, United Kingdom;

    Fraunhofer-lnstitut fuer Angewandte Festkoerperphysik, Tullastrasse 72, 79108 Freiburg, Germany;

    Fraunhofer-lnstitut fuer Angewandte Festkoerperphysik, Tullastrasse 72, 79108 Freiburg, Germany;

    Department of Chemistry, Chemistry Research Laboratory, University of Oxford, Mansfield Road, Oxford OX1 3TA, United Kingdom;

    Institut fuer Festkoerpertheorie und-Optik, Friedrich-Schiller-Universitaet, Max-Wien-Platz I, D-07743 Jena, Germany;

    Department of Physics, University of Warwick, Coventry CV4 7AL, United Kingdom;

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  • 正文语种 eng
  • 中图分类
  • 关键词

    optical properties of bulk materials and thin films; semiconductor compounds; electron states at surfaces and interfaces; photoemission and photoelectron spectra;

    机译:散装材料和薄膜的光学性能;半导体化合物表面和界面的电子态;光发射和光电子能谱;

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