Commentary by U. Thiele: 'Tentative interpretation of the dewetting morphologies presented by Tsui et al. in the preceding paper'

摘要

References [1] and [2] report on dewetting experiments for polystyrene (PS) films on silicon substrates covered with a 106 nm thick oxide layer [3]. They describe three different types of rupture process: (i) For very thin films below about 5 nm the film ruptures through spinodal dewetting characterized by a bicontinuous pattern known from spinodal decomposition.